Nano-Porous Silicon
for 3D biosensing surface
NanoPorous silicon is produced by an electrochemical etching process. Average pore size for biosensor applications is 80 nanometers. After etching, the porous structure surfaces are passivated, using silane chemistry, which in turn prepares the surfaces for application of additional hydrophillic surface chemistries.
SEM of top surface of nano-porous Silicon (npoSi) chips. NanoPorous Silicon can be engineered to vary the average diameter or the depth of the pores.
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